ELEMENT 3—5 is pleased to present at the 10. NRW Nano Conference as an exhibitor. In addition to addressing customers, the main focus is on the exchange with the scientific community as well as the personal introduction to specialists and student talents as potential employer.
The 10 NRW Nano Conference (www.nanoconference.de) will take place from 23 to 24 May at the Dortmund Congress Centre. In addition to novel ICP ion sources, ELEMENT 3—5 will present its disruptive low-temperature epitaxy. The latest generation of ELEMENT 3—5 epitaxy systems – the ACCELERATOR 3500K – enables customers from the fields of high-power electronics, the display industry or mobile communications technology to manufacture their products in improved quality and with significantly higher efficiency.
"In addition to today's common semiconductor material systems, we see great potential for other applications with our technology. Due to the low process temperature, novel combinations of materials are possible on the one hand, and completely different, temperature-sensitive substrates for semiconductor growth on the other. " Volker Sinhoff points out some of the interesting topics for the exchange with scientists and specialists during the conference. "In addition, as a young company, we are in a strong growth phase. I am therefore looking forward to a personal conversation with visitors in order to bring them closer to our special position in the semiconductor area and to convince one or the other of us as a potential, exciting employer," says Dr. Sinhoff, describing another motivation to be represented as an exhibitor at the NRW Nano Conference.
Feel free to visit the ELEMENT 3—5 booth at the NRW Nano Conference. We look forward to seeing you!